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2009, 485:637–641.CrossRef 37. Guang-She L, Li-Ping L, Smith RL Jr, Inomata H: Characterization of the dispersion process for NiFe 2 O 4 nanocrystals in a silica matrix with infrared spectroscopy and electron paramagnetic resonance. J Mol Struct 2001, 560:87–93.CrossRef Competing interests The authors declare that they have no competing interests. Authors’ contributions ZS prepared all the samples, participated in all the measurements and data analysis, and drafted the manuscript. DX and DG conceived and designed the manuscript. JZ carried out the XPS measurements and data analysis. ZZ1 carried out the XRD measurements and data analysis. ZZ2 participated in the VSM measurements. 4��8C ZY participated in the data analysis and interpretation of the results. All authors selleck products have been involved in revising the manuscript and read and approved the final manuscript.”
“Background Silicon is one of the most important semiconductor materials due to its crucial role in modern integrated circuit technology. However, the indirect bandgap structure restricts its future application in Selleck AZD6738 optoelectronics. Nowadays, silicon
nanomaterials are regarded as promising candidates in various areas such as renewable energy [1–4], biological applications [5, 6], and chemical sensors [7–10]. It is also considered that silicon nanostructure, with diameter below the Bohr radius of silicon (4.3 nm), could conquer the physical disability of poor luminescence in bulk Si [11, 12]. Several silicon nanostructures, such as porous Si [13–15] and Si nanocrystals [16–18], have been widely studied in the past 20 years. However, little attention has been paid to the luminescence property of silicon nanowires (SiNWs) due to the difficulty of preparing nanowires with the diameter of several nanometers. It has been reported that vapor–liquid-solid (VLS) process is available for the achievement of nanoscale SiNWs [19, 20]. Yet, the luminescence stability is poor due to the surface termination conditions. In addition, it is difficult to avoid the creation of defects in the nanowires.